Bachelor of Science in Electrical Engineering - Electronic and Photonic Devices and Systems
在壬色列理工學院
關於課程
The discovery of new devices and improvement of existing ones led to the modern electronic industry. These new devices are the basic building blocks of any new systems that positively impact daily life. Many department faculty work on developing such new devices using cutting edge technology and then employ them in building state of the art systems. State of the art laboratory facilities exist to carry out advanced study and research in these areas.
A common user facility accessible to all students and faculty is the Microscale and Nanoscale Fabrication Cleanroom (MNCR) housed in the Center for Materials, Devices, and Integrated Systems (cMDIS). This MNCR is equipped with up to 8? wafer tools for end-to-end device fabrication, characterization, metrology, and testing of silicon-based devices and integrated circuits, and an array of equipments for compound semiconductor device processing. In addition, the nanolithography tools, such as nanoimprint, nano ink, and direct e-beam writer, enable micro-nano-electronic and photonic device fabrication at feature size of 10 nm. This MNCR is being used extensively for research in many areas, including the discovery and invention of new electrical, optical, and thermal interconnect solutions, hyper-integration of heterogeneous components for future terascale systems in AI, Internet of Things, and bio-medical devices and systems.
A common user facility accessible to all students and faculty is the Microscale and Nanoscale Fabrication Cleanroom (MNCR) housed in the Center for Materials, Devices, and Integrated Systems (cMDIS). This MNCR is equipped with up to 8? wafer tools for end-to-end device fabrication, characterization, metrology, and testing of silicon-based devices and integrated circuits, and an array of equipments for compound semiconductor device processing. In addition, the nanolithography tools, such as nanoimprint, nano ink, and direct e-beam writer, enable micro-nano-electronic and photonic device fabrication at feature size of 10 nm. This MNCR is being used extensively for research in many areas, including the discovery and invention of new electrical, optical, and thermal interconnect solutions, hyper-integration of heterogeneous components for future terascale systems in AI, Internet of Things, and bio-medical devices and systems.
開始日期及學費
如何申請
Entry requirements for 壬色列理工學院
Official copies of all academic transcripts from secondary schools, with English translations.
The TOEFL is required for all non-native English speakers, and Rensselaer expects a minimum TOEFL score of at least 88 iBT, or 570 PBT. An IELTS score of at least 7.0.
English language requirements
托福(TOEFL iBT)總分: 88.0
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